1973

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The industry's first functional device with dielectric isolation of both emitter-base and base-collector junctions.Incorporated Isoplanar II,a process which permits reduction in the size of integrated circuit transistors by 70 percent over conventional technology,and by 40 percent over Fairchild's original Isoplanar technique.The performance of Isoplanar II devices is improved by a factor of two over the performance of comparable devices made with conventional processes.

编辑:冀凯 引用地址:1973

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